天眼查APP顯示，近日，杭州中為光電技術有限公司,浙江晶盛機電股份有限公司,浙江晶瑞電子材料有限公司申請的“晶圓拋光研磨下片緩存裝置及下片方法”專利獲(huo)授權(quan)。摘要(yao)顯示(shi)，本(ben)申請(qing)公開(kai)了(le)一種晶(jing)圓(yuan)拋(pao)光研磨(mo)下片(pian)(pian)緩存裝置(zhi)及下片(pian)(pian)方法，涉(she)及半導體制造技術領域，晶(jing)圓(yuan)拋(pao)光研磨(mo)下片(pian)(pian)緩存裝置(zhi)包括水槽、多個(ge)(ge)固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)和多個(ge)(ge)運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)。水槽頂(ding)部開(kai)口且(qie)四周和底(di)部封(feng)閉。固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)固(gu)定(ding)(ding)(ding)(ding)于水槽底(di)部并沿(yan)(yan)著(zhu)水槽底(di)部間隔設置(zhi)，每(mei)個(ge)(ge)固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)能(neng)夠容(rong)納至(zhi)少(shao)(shao)一片(pian)(pian)晶(jing)圓(yuan)。運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)和固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)交(jiao)替設置(zhi)，且(qie)每(mei)個(ge)(ge)運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)能(neng)夠容(rong)納至(zhi)少(shao)(shao)一片(pian)(pian)晶(jing)圓(yuan)；運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)沿(yan)(yan)水槽高度方向可升(sheng)降(jiang)設置(zhi)。當需要(yao)放(fang)(fang)置(zhi)晶(jing)圓(yuan)時(shi)，運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)上升(sheng)，對(dui)應晶(jing)圓(yuan)能(neng)夠同時(shi)放(fang)(fang)置(zhi)于運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)和固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)上，且(qie)運(yun)(yun)動(dong)(dong)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)和固(gu)定(ding)(ding)(ding)(ding)支(zhi)(zhi)(zhi)(zhi)(zhi)架(jia)(jia)上的(de)晶(jing)圓(yuan)相(xiang)互平行。通過上述設置(zhi)，本(ben)申請(qing)實現了(le)單次放(fang)(fang)置(zhi)多片(pian)(pian)晶(jing)圓(yuan)進行緩存的(de)技術效果，提高了(le)下片(pian)(pian)效率的(de)同時(shi)也減(jian)少(shao)(shao)了(le)機械(xie)手(shou)的(de)占用時(shi)間。